Used AIRCO TEMESCAL HRS 2550 #89776 for sale

AIRCO TEMESCAL HRS 2550 is a sputtering equipment engineered by AIRCO/Temescal for advanced thin-film deposition applications. It is a high-reliability, large-capacity system that is widely used for the deposition of dielectrics, metals, and semiconductors on various substrates. HRS 2550 features a powerful dual-platen sputtering apparatus for high-accuracy and repeatable results. The unit can accommodate up to four substrates and features an adjustable shutter on each chamber for additional versatility. The AIRCO/Temescal AIRCO TEMESCAL HRS 2550 machine is equipped with advanced digital control modules that allow for precise parameter management and high-accuracy deposition of materials. The digital control includes a multiprocessor tool monitor, a built-in language interpreter, a real-time clock, and an integrated motion controller. This allows the asset to operate in a non-user-defined mode and allows for the selection of preset parameters for various thin-film applications. The AIRCO/Temescal HRS 2550 model also includes advanced sputtering components, such as magnetic drive switching and dual shutter mechanisms, that ensure precision and accuracy in deposition. The magnetic drive switching equipment allows for the easy and precise selection of the sputtering deposit speed and allows for precise, repeatable results. The dual shutter mechanisms provides precise film thickness control and allows for accurate, repeatable thin-film deposition even on uneven substrates. The AIRCO/Temescal AIRCO TEMESCAL HRS 2550 system also features a built-in reactive-ion etching (RIE) capability, which allows for the precise etching of thin-film materials. The RIE capability also allows for complex, multi-layer patterning and provides a high-accuracy thin-film polish and passivation. Overall, the AIRCO/Temescal HRS 2550 is a high-performance, large-capacity sputtering unit designed for precise, repeatable thin-film deposition. The machine is highly durable and reliable and is equipped with advanced digital control, precise sputtering components, and reactive-ion etching capabilities. As such, it is an ideal tool for high-end thin-film deposition and etching applications.