Used AJA ATC 3400-V #9213688 for sale

AJA ATC 3400-V is a high-performance sputter equipment designed for high-DOI thin film applications. The system utilizes electron beam evaporation technology to effectively sputter complex aluminum oxide thin films at a high rate. It employs two high-performance ion sources that produce a uniform high-density plasma and delivers superior uniform deposition rates, providing superior and cost-effective deposition control. The unit can be operated in either vertical or horizontal configurations and is designed to be compatible with direct current (DC) and alternating current (AC) operation. ATC 3400-V offers automated process monitoring and control, as well as advanced ion beam analysis (IBA) technology, which enables measurements of elemental distribution and grain size, as well as measuring grain size distribution within the film. The machine offers six standard target options for sputtering--Al-Ni target, Al-SiC target, Ni-C target, Al-Ta target, Al-Sn target, and Al-Cu target. Additionally, the tool offers an external gas asset which allows for the sputtering of α-Al2O3, β-Al2O3, and TiO2. The model also includes an online service monitor that can identify anomalies in the sputter process and diagnose problems before they can damage the thin film. AJA ATC 3400-V has a working environment temperature range of 4°C to 40°C and a relative humidity range of 0%-85%. It provides two heated load locks that can accommodate substrates up to twelve inches in diameter. The robust design of ATC 3400-V offers a high deposition rate of up to 20 μm/min, ensuring that it is suitable for high-volume production. AJA ATC 3400-V is designed with safety in mind, with both physical and electronic safety features. The equipment includes a safety enclosure and an E-STOP switch, to quickly and easily shut down the system if needed. Additionally, the unit is capable of being controlled via a remote network, providing peace of mind when operating the machine without being in the same location. In conclusion, ATC 3400-V is a high-performance sputtering tool that is suitable for producing high-DOI thin films. It offers an automated process to monitor and control the deposition rate, as well as a range of high-performance ion sources and target options. It is also designed with robust components for a high deposition rate, and with safety features for peace of mind.