Used ALCATEL / ADIXEN / PFEIFFER SCM 650 #9258696 for sale

ID: 9258696
Sputtering system RF/DC Sputtering Ionic cleaning Cathodes: (2) Magnetron targets, 8" Substrate transport load lock: 6" Diameter substrates Substrate holder: (4) Stations (6) Indexed positions (4) Transfers with (2) sputtering positions Rotation: 1 to 30 RPM Vertical translation: 50 to 100 mm Shutter: 1 3/4 Automatic shutter Generators: RF Generator: 2000W For the targets 1 and 2 and substrate holder DC Generator: 3000W For the targets 1 and 2 (2) Gas lines.
ALCATEL / ADIXEN / PFEIFFER SCM 650 is an advanced, full-capability sputtering equipment with variable high-voltage power supply and robust controls to achieve and maintain an accurate deposition process. This state-of-the-art PVD system is designed for the industrial deposition of thin films that are ideal for optical coating and magnetic data storage applications. ADIXEN SCM 650 consists of an efficient high-voltage power supply, a precise magnetic filter and a full-sized sputtering chamber. The chamber is designed for optimal heat management and contains a powerful uniform magnetic field for extremely accurate thin-film deposition. The highly efficient high-voltage power supply provides powerful, precise, consistent power for vacuum deposition of thin films. The power supply is capable of operating at high voltages up to 2.5kV and provides sputter power from 0.5kW to 20kW (clustered configuration). The power supply also allows for the variation of power with time and temperature leveled control curves. The precise magnetic filter of ALCATEL SCM 650 helps to ensure the uniform sputtering process by filtering out impurities in the atmosphere. The magnetic filter also maintains the homogeneity of the film deposition, creating uniform thin films on the substrate. PFEIFFER SCM 650 is equipped with a variety of features to maximize uniformity and process control. It has an internal wafer monitoring unit, a precise switching machine, a temperature controller and an oxygen monitor. It also offers advanced plasma control systems such as a multi-zone gas distribution tool and a dual gas injector. The gas injection asset allows for precise control of the gas flow and temperature control with the temperature-controlled anode and cathode. SCM 650 is an ideal model for high-accuracy thin-film deposition for application such as optical thin-film coatings and magnetic data storage media. It offers consistent, precise, high-efficiency sputtering for an even and consistent thin-film deposition. The fully integrated equipment offers effective and precise control for a reliable and accurate process.
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