Used AMAT / APPLIED MATERIALS ATON 1600 #9248312 for sale
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ID: 9248312
Sputtering system
Process chambers:
(2) Planar chambers
(2) Rotary chambers.
AMAT / APPLIED MATERIALS ATON 1600 sputtering equipment is a highly advanced versatile tool for both physical vapor deposition (PVD) and chemical vapor deposition (CVD). AMAT ATON 1600 uses a ultra-high vacuum, state-of-the-art technologies, and advanced materials and processes to achieve the highest levels of deposition uniformity and reproducibility. APPLIED MATERIALS ATON 1600 enables users to sputter two or more target materials onto multiple substrates simultaneously. Each process is controlled independently through a proprietary system, allowing users to control individual process parameters such as chamber pressure, target power, substrate temperature, and gas flow rates. Further, ATON 1600 allows for automated cycling events between deposition and cycles, enabling users to control exactly how the material is prepared, deposited, and cured. AMAT / APPLIED MATERIALS ATON 1600 also utilizes an advanced ion-beam surface pre-treatment technology for inorganic materials and diamond-like films. This innovative technique involves the bombardment of a substrate (or a separate piece of substrate material) with an energetic ion beam. This causes the material to become atomically amorphous and highly reactive. Atomically clean surfaces can then be formed by sputtering or plasma-assisted deposition using AMAT ATON 1600. This high-energy sputtering as well as low-energy reactive ion etching can be used to obtain ultra-fine thickness uniformity and improved step coverage with a high degree of precision. By using these aberration-free deposition techniques, APPLIED MATERIALS ATON 1600 enables users to create extremely uniform films even on difficult substrates. ATON 1600 also features a unique dual-Load-Lock configuration that allows for fast and easy loading of the unit, while providing constant vacuum integrity and high throughput. The machine further features an advanced, automated plasma-assisted high-density plasma source for high precision etching processes. AMAT / APPLIED MATERIALS ATON 1600 also comes equipped with an integrated actuator which enables direct control of substrate rotation and positioning during deposition. AMAT ATON 1600 is an ideal tool for such applications as optical thin-film deposition, hard-disc storage media, precision-based deposition, seal-ring deposition, multilayer stacks, and more. By utilizing the revolutionary technologies and processes available with APPLIED MATERIALS ATON 1600, users are able to create superior thin-film deposition results that are highly uniform and have excellent step-coverage.
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