Used AMAT / APPLIED MATERIALS ATON 1600 #9354651 for sale

AMAT / APPLIED MATERIALS ATON 1600 is a sputter deposition equipment designed for producing high-quality, high-precision thin film coatings. The sputtering system is powered by a 4 kW DC magnetron capable of producing a wide range of film types for a variety of applications. The unit is composed of an insertable sputter source, an automatic substrate exchange station, and an acquisition workstation. It is a state-of-the-art machine designed for high precision and long-term reliable operation. AMAT ATON 1600 sputtering tool incorporates a variety of features designed for optimal sputtering performance. Its sputter source features an RF-driven process which limits oxidation of sputtering materials and allows for higher density films. Additionally, its source is capable of providing adjustable target-to-substrate distances enabling independent power levels for each target. Furthermore, its design allows for quick, adjustable sputter times allowing for greater control over sputtering processes. APPLIED MATERIALS ATON 1600 also features an automatic substrate exchange station. This station is designed to minimize substrate movement and improve substrate control, resulting in improved uniformity of thin film coatings. It also features a sophisticated software interface which allows users to easily configure various options including the substrate type, the rotation speed of the target, the number of passes, the gas pump level, and the intensity of the ion source. Lastly, ATON 1600 sputtering asset features an acquisition workstation which provides users with real-time monitoring of the sputter deposition process. Users can view film characteristics, such as deposition uniformity, rate, and surface roughness, and can control the power, pressure, gas flow, etc. in order to ensure the highest quality thin film coatings. In conclusion, AMAT / APPLIED MATERIALS ATON 1600 sputtering model is a state-of-the-art, high-precision, reliable equipment designed for producing high-quality thin film coatings. Its features, including its RF-driven sputter source, automatic substrate exchange station, and acquisition workstation, allow users to easily configure and monitor sputtering processes for the best possible results.