Used AMAT / APPLIED MATERIALS Centura PVD #9266097 for sale

AMAT / APPLIED MATERIALS Centura PVD is an advanced Physical Vapor Deposition (PVD) reactor designed and manufactured for high-performance thin film deposition applications. The equipment enables very accurate thin-film growth and includes a range of features designed to maintain precision and repeatability while offering high productivity and production yield. AMAT Centura PVD features a single process chamber where thin film deposition occurs, a vacuum environment for maintaining process purity and a set of motion-based hardware components for basic material transport and substrate intent manipulation. The system is highly automated and includes a full set of sensors, automated processes and computer-controlled systems for controlling the deposition process. The cabinet-integrated computer provides a full range of controls and unit parameters, and a backside software package is available to facilitate connection and control. APPLIED MATERIALS Centura PVD machine includes advanced deposition processes such as atomic layer deposition (ALD) and pulsed laser deposition (PLD). ALD enables the formation of ultra-thin layers of materials, while PLD is used for the growth of steels, non-alloyed metals and alloys. The chamber is equipped with an access window for media-assisted deposition, which allows for the introduction of target materials from the external environment into the process chamber. This process is used for rapid deposition of metals, ceramic and polymers, as well as for sputter-etching operations. Centura PVD tool is equipped with a variety of gas and oxygen inlet capabilities for introducing specific gases into the process chamber. This enables to optimize substrate surface chemistry and stability. The ability to monitor and control chamber temperature, pressure and gas blend enables the growth of materials to meet customer specific requirements. In addition, AMAT / APPLIED MATERIALS Centura PVD comes with a variety of advanced diagnostics capabilities to ensure reproducible process results. This includes an extensive combination of in-situ and ex-situ diagnostic tools that allow precise control of the growth process and substrate morphology control. The asset also features a full range of safety systems, such as auto shutdown, to protect the equipment from damage or accident. AMAT Centura PVD model offers an advanced, high performance platform for a variety of thin film deposition applications. Its powerful equipment components, automated processes, advanced diagnostic and safety features, and its sophisticated customization capabilities make this an ideal system for a wide range of research and production needs.