Used AMAT / APPLIED MATERIALS Endura 5500 #190620 for sale
It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.
Tap to zoom
Sold
ID: 190620
Wafer Size: 8"
Vintage: 1995
PVD Sputtering system, 8"
Chamber Type: 4 Chamber (1 Standard Body, 3 Wide Body), Pre-Clean 1 Type
Process: Al Cu, Ti, TiN
Wafer size: 8" / JMF
Configuration:
Chamber A: Pass through
Chamber B: Cool down
Chamber D: Preclean I
Chamber F: Orienter degas
Chamber 1: ALCu (clamp)
Chamber 2: TiN (101)
Chamber 3: Ti (101)
Chamber 4: Ti (clamp)
Robot:
Buffer: HP
Transfer: HP
Load Lock:
Narrow body with tilts in/out
No sliding sensor kit
Chamber A:
Type: pass through
Lid: metal
Cooling method: N/A
Chamber B:
Type: cool down
Lid: metal
Cooling method: by PCW / by gas
Chamber D:
Type: Preclean I
Process: oxide etch
RF Gen/DC power supply 1: CPS-1001
RF Gen/DC power supply 2: N/A
Leybold 361C: Turbo/Cryo pump Type
Chamber 1:
Type: standard body
Process: Al Cu, 0010-20225
RF Gen/DC power supply 1: AE MDX-L12M (Master)
RF Gen/DC power supply 2: AE MDX-L12 (Slave)
RF Gen/DC power supply 3: N/A
Turbo/Cryo pump Type: Cryo Pump, 3 phase
Gate valve type: 2-position
Pedestal type: Clamp (4F)
Process Gas:
Ar STEC 100 N2 100sccm
Ar-HTR STEC 100 N2 100sccm
Chamber 2:
Type: wide body
Process: TiN, 0010-20223 B+
RF Gen/DC power supply 1: AE MDX-L12
RF Gen/DC power supply 2: N/A
RF Gen/DC power supply 3: N/A
Turbo/Cryo pump Type: Cryo Pump, 3 phase
Gate valve: 3-position
Pedestal type: 101
Process Gas:
N2 STEC 200 N2 200sccm
Ar STEC 100 N2 100sccm
Chamber 3:
Type: wide body
Process: Ti, 0010-20223 B+
RF Gen/DC power supply 1: AE MDX-L12
RF Gen/DC power supply 2: N/A
RF Gen/DC power supply 3: N/A
Turbo/Cryo pump Type: Cryo Pump, 3 phase
Gate valve: 3-position
Pedestal type: 101
Process Gas:
N2 STEC 200 N2 200sccm
Ar STEC 100 N2 100sccm
Chamber 4:
Type: wide body
Process: Ti, 0010-20223 B+
RF Gen/DC power supply 1: AE MDX-L12
RF Gen/DC power supply 2: N/A
RF Gen/DC power supply 3: N/A
Turbo/Cryo pump Type: Cryo Pump, 3 phase
Gate valve type: 3-position
Pedestal type: clamp (4F)
Process gas:
N2 STEC 200 N2 200sccm
Ar STEC 100 N2 100sccm
Ar-HTR STEC 100 N2 100sccm
Heat exchanger: Neslab Type II
Compressor type: CTI 8500, CTI 9600
SBC type in controller: V21
Ion gauge type: nude
Main AC box: 220VAC, 3 Phase, 60Hz
System Monitor:
1st Monitor: stand alone
2nd Monitor: through the wall
3rd Monitor: -
Installed
1995 vintage.
AKT AMAT / APPLIED MATERIALS / AKT Endura 5500 Reactor is an advanced thermal processing equipment designed for efficient efficient sintering of ceramic capacitors. The system features an optimized thermal process control capability which ensures uniform and repeatable heating of ceramic materials and provides better temperature control over wide process range. AKT Endura 5500 also provides high throughput rates with comprehensive contamination prevention features for a reliable and repeatable sintering process. AMAT ENDURA 5500 features a low pressure and reactive gas environment for optimal sintering. An independent modulating control allows for maximum flexibility for individual process parameters. Multi-zone, low pressure heated process chambers are thermally well insulated and can be used to quickly heat and cool the work pieces. APPLIED MATERIALS ENDURA 5500 also allows modifications of cycle times to meet specific requirements. The unit is equipped with advanced process monitoring and control features that can be used to optimize machine performance. These features include active zone control, temperature uniformity, fault recovery, over-temperature protection, thermal runaway protection, pressure monitoring, cycle termination and profile monitoring. This helps users maximize sintering cycle accuracy for better quality and repeatable results. Endura 5500 also features automatic wafer mapping and tracking capabilities for full traceability along the sintering process. To meet the highest reliability requirements, the tool is designed to support process cleanliness for contamination prevention and is compliant with industry standards. AMAT / APPLIED MATERIALS / AKT ENDURA 5500 is an advanced and reliable reactor specifically designed for ceramic capacitor sintering. The asset offers enhanced process control with active zone control, temperature uniformity, fault recovery, over-temperature protection and pressure monitoring for better repeatable results. It also features an automated wafer mapping and tracking capabilities for traceability. The model is designed to prevent contamination and is compliant with industry standards, making it an ideal choice for ceramic capacitor sintering.
There are no reviews yet