Used AMAT / APPLIED MATERIALS ENDURA #9055225 for sale

AMAT / APPLIED MATERIALS ENDURA Reactor is a high-quality, high-performance chamber dedicated to the production of semiconductor materials. The reactor is designed as an integral part of a process that begins with chemical vapor deposition (CVD). It provides a unique combination of high deposition rates, low particle counts and small chamber volumes that ensure the highest yields in rapid transistor fabrication. AMAT ENDURA Reactor consists of a vacuum chamber and an external gas delivery equipment. The chamber design allows for the delivery of a combination of gases for chemical reaction within the chamber. The delivery of the gases is designed to eliminate turbulence, maximize uniformity, and maintain particle counts at a minimum. The delivery system is also designed to enable high pressure and low pressure conditions to optimize process performance and yields. APPLIED MATERIALS ENDURA Reactor is also designed to maximize temperature uniformity. The dual wafer geometry is designed to enable the most uniform thermal deposition rate and optimum temperature distribution for maximum throughput and lower scrap rates. ENDURA Reactor is also equipped with powerful heating elements that ensure rapid heating of the chamber and wafers. This results in the rapid growth of thin films on the wafers and high deposition rates in the production of semiconductor devices. The combination of the powerful heating elements and the direct air-cooling systems ensure rapid cooling of the chamber, to ensure the growth of pure, uniform films. AMAT / APPLIED MATERIALS ENDURA Reactor is also equipped with a state-of-the-art monitoring unit. The machine provides real time monitoring and control of the chamber temperature, pressure, purity, particle count, and flow rate of the processing gases. This allows for the highest process yields and accuracy. The monitoring tool can interface with the process control systems and provide feedback on the performance of the process. AMAT ENDURA Reactor is the ideal chamber for the production of high-quality, high-performance semiconductor materials. It is designed with advanced technology and cutting-edge safety systems to ensure optimum process performance and yields. This chamber guarantees the highest quality and efficiency in semiconductor fabrication.