Used AMAT / APPLIED MATERIALS ENDURA #9266616 for sale

AMAT / APPLIED MATERIALS ENDURA Reactor is a high-performance CVD (Chemical Vapor Deposition) platform used to grow a variety of thin-film materials. It can be used to produce a range of thin-films including polysilicon, silicon nitride, amorphous silicon, dielectrics, and metal layers. With its high-end automation, the equipment can ensure repeatable results and improved production yield. This system is equipped with the Advanced Epitaxial Lift-off Performance (ACELP) Substrate Stacker loader, which helps improve production throughput and efficiency. The unit also allows users to quickly and accurately change recipe without the need for manual intervention. The process chamber is designed to meet a wide range of application needs, and it also provides an excellent combination of process stability, uniformity, and control. This machine features a high-performance microcontroller that enables automation features like auto-learns for greater efficiency and accuracy. It is designed to reduce recipe complexity and shorten cycle-times. The tool also has a powerful graphic user interface (GUI) to help users quickly set up and control processes. The asset can be integrated with a factory automation model for increased process monitoring and control. AMAT ENDURA Reactor is a highly reliable and flexible equipment with a wide range of capabilities. It is well-suited for mass production of high volume and medium layer applications as well as research-level fine film deposition. With automated controls and robust process surveillance and reporting, this system will provide reliable and uniform results. The efficient and reliable design of this unit makes it an ideal choice for a wide range of thin-film deposition and ultra-high vacuum applications.