Used AMAT / APPLIED MATERIALS New Aristo (NAR) 1200 #293763724 for sale
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ID: 293763724
Vertical inline sputtering system
Applications: Metal, SiO2 / ITO
Throughput: 270 Substrates/h
Compressed air pressure: 5.5 Bar
Chamber:
Material: Stainless steel
Vacuum leakage: ≤1x10-8 mbar l/sec
Carrier transfer system:
AC Motor
Conveyor
One feedthrough per chamber
Substrate carrier:
Material: Aluminum
Dimensions:
1700 x 1100 mm²
1700 x 980 mm²
Vacuum measuring equipment:
Pirani vacuum meter type: Thermovac TR 306
Cold Ionization vacuum type: PKR 251
Capacitance vacuum meter type: MKS Baratron 627
Sputter cathode:
Type: DC Magnetron
Material of backing plate: Cooper with cooling channel
Target fixing: Bonding
Magnetic field:
SiO2 / Cr: Magnet array
ITO
Target size:
ITO: 1400 x 190 x 6/9 mm
Cr: 1400 x 190 x 12 mm
SiO2: 100 x 100 x 16 mm
Cooling water specification:
Pressure minimum / Maximum: 5/7 bar
Water inlet temperature range: 15° C-25° C
Constant temperature: ±2°C
Hardness of water: 6-8°dH
pH Value: 8-10
Foreign particles:
Size: Maximum 100 µm
Concentration: Maximum 10/cm³
Dissolved C1: Maximum 20mg/l
Dissolved CO2: Maximum 15 mg/l
Sputter gas:
Argon
CO2
Argon/Oxygen (95/5)
Oxygen
Nitrogen
Ambient requirements:
Temperature machine control room: 20°-25° C
Relative humidity: ≤ 60 %
Vacuum data:
Entrance / Exit chamber: ≤ 2 E^-02 hPa
Transfer chamber: ≤ 5 E^-06 hPa
Process chamber: ≤ 1 E^-06 hPa
Purity of sputter gas: 99.999%
Turbo molecular pump
Rotary pump
Roots pump
ADVANCED ENERGY MDX Power supply
Heater system
PC
Operating system: Windows
Power supply: 400 V, 3 Phase, 60 Hz, 5 Wires (3 AC, N, PE).
AMAT New Aristo (NAR) 1200 is a state-of-the-art sputtering equipment designed for high-performance thin film deposition in semiconductor manufacturing processes. This advanced system incorporates cutting-edge technology to provide exceptional precision, uniformity, and repeatability for a wide range of sputtering applications. The NAR 1200 offers a comprehensive solution for depositing thin films with superior quality and efficiency, making it an ideal choice for industries requiring advanced thin film coating capabilities. One of the key features of the NAR 1200 is its advanced sputtering technology, which allows for precise control over the deposition process. The unit is equipped with a high-power RF sputtering source, enabling efficient ion bombardment and sputtering of target materials onto the substrate surface. This results in a uniform and dense thin film coating with excellent adhesion and film properties. The NAR 1200 also features a customizable chamber configuration, allowing for flexibility in accommodating various substrate sizes and shapes. This versatility makes the machine suitable for a wide range of applications, from small-scale research and development projects to high-volume production processes. The chamber is constructed with high-quality materials to ensure compatibility with a variety of target materials and deposition conditions. In addition to its advanced sputtering capabilities, the NAR 1200 offers precise control over process parameters such as deposition rate, target utilization, gas flow, and substrate temperature. The tool is equipped with a user-friendly interface that allows operators to easily program and monitor the deposition process in real-time. This seamless interface enables efficient operation and optimization of thin film deposition parameters to achieve desired film properties and performance characteristics. Furthermore, the NAR 1200 is designed with advanced safety features to ensure operator protection and asset integrity during operation. The model incorporates interlocks, monitoring sensors, and automated shut-off mechanisms to prevent potential hazards and maintain a controlled environment. These safety measures enhance the overall reliability and performance of the equipment while ensuring compliance with industry regulations and standards. Overall, APPLIED MATERIALS New Aristo (NAR) 1200 sputtering system is a cutting-edge solution for high-performance thin film deposition in semiconductor manufacturing applications. With its advanced sputtering technology, customizable chamber configuration, precise process control, user-friendly interface, and safety features, the NAR 1200 offers unmatched capabilities for achieving superior thin film coatings with exceptional quality and efficiency. This unit is an ideal choice for industries seeking advanced thin film coating solutions to meet their evolving requirements for high-performance semiconductor devices.
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