Used AMCI GT7777 #89910 for sale

AMCI GT7777 Sputtering Equipment is a comprehensive systems solution for thin film deposition. It is a scalable, easy-to-use tool that enables thin film deposition for development and production applications. GT7777 is a dynamic system that offers superior process control and rapid sputtering results in a cost-effective package. AMCI GT7777 unit is ideal for low-volume production, research and development, or pilot line use. GT7777 sputtering machine utilizes the latest technology and versatile components to ensure superior process control and superior performance. Its components include a high-performance thin film sputtering source, high-power plasma source for etching, target carousel for fast changes in target sputtering materials, gas-assisted sputtering for coatings, a powerful in-situ vacuum pressure control tool, and variable-power microwave plasma sources for difficult thin film applications. Additionally, the asset comes with a host of automated functions, including automatic target sputtering pressure control, adaptable process recipes, advanced plasma profile control, and sophisticated measurement and analysis tools. AMCI GT7777 measures film deposition characteristics with absolute precision. The process can be carefully monitored and controlled, allowing for repeatable, consistent thin film results. The model also provides a flexible platform, allowing the user to incorporate process add-ons such as in-vacuum cleaning, pre-sputtering processes, wafer-edge trimming, and post-deposition processing. GT7777's sophisticated design allows for flexible deposition of a variety of thin film materials, ranging from simple aluminum thin films to complex alloys and composites. The equipment can produce thin films that meet a variety of application requirements, including flatness, uniformity and electrical characteristics. AMCI GT7777 is easy to use and cost effective, making it ideal for both development and production applications. It is designed for quick and easy setup, providing superior process control in a cost-effective package. The system also enables fast and accurate thin film results in a variety of thin film deposition applications.