Used ANATECH Hummer VI #9231237 for sale

ANATECH Hummer VI is a state-of-the-art sputtering equipment designed to provide superior film quality and uniformity compared to other systems. Hummer VI has been specifically designed to accommodate a variety of substrate materials while providing the highest level of process repeatability and reproducibility. The system's unique sputtering technology utilizes an adjustable-height adjustable chamber, allowing for tailoring to each specific product. The result is superior surface quality and uniformity on substrates of various sizes and shapes. ANATECH Hummer VI features a high gloss metal surface chamber, allowing for enhanced film performance on various types of substrates such as glass and other non-metallic materials. The diameter of the chamber is adjustable and can accommodate a variety of sizes from 200mm to 900mm. The unit is equipped with a low-pressure spark plasma source, allowing for consistent film thicknesses and optimal speed of deposition over a wide range of materials. Additionally, the machine uses a non-contact motion control tool and magnetic saturation sputter technique. This technology optimizes the process of sputtering, ensuring maximum uniformity and repeatability of each process. Hummer VI also features a high-performance substrate heater that is designed to maintain optimal deposition temperature and to prevent particulate generation. The asset is also capable of controlling the pressure, duty cycle and temperature during the deposition process, which results in improved uniformity and film properties. ANATECH Hummer VI has been designed to meet the highest standards and provides superior quality, reproducibility and scalability for a variety of sputtering applications. The model offers various levels of automation, allowing for improved process control and flexibility. Furthermore, the equipment is compatible with a range of materials, allowing for greater versatility and improved cost efficiency. Its modular design also ensures easy installation and reduced maintenance costs. In addition, its unique focused sputtering process ensures better deposition of film thickness uniformity, allowing for more reliable testing results.