Used ANATECH Hummer VIII #9249717 for sale

ANATECH Hummer VIII is a sputtering equipment designed for the deposition of thin films onto low-warpage and high-temperature substrates. It features a robust, highly flexible platform able to deposit a wide range of materials, including oxide, nitride, and metals. The system also offers superior film uniformity and repeatability, making it an ideal choice for demanding applications. Hummer VIII includes a high-temperature substrate chamber, capable of reaching temperatures up to 800°C. This provides the user with the ability to process a variety of high-temperature substrates and also enables the use of PECVD coatings. The HuVII also offers a wide range of sputtering targets, including Si/SiO2 and SiC/SiNx, as well as dielectric and metal options. A particularly advantageous feature of the unit is the option of pair or multi-target configurations, which allow coating processes to be optimized to produce materials with specific properties. ANATECH Hummer VIII includes a wide range of process controls, enabling precise deposition rates and thicknesses to be maintained. This can be achieved through a combination of process parameters, including gas flow rate, gas composition, pressure, RF power, sputter rate and temperature. Additionally, the HuVII offers automated control of the substrate movement, allowing for optimization of the coating parameters. Hummer VIII is an ideal machine for creating high-quality thin films, due to its robust, highly flexible platform and its wide range of deposition features. It is well-suited for a variety of applications, including the deposition of superconductors, transparent conductors, dielectrics, and magneto-optical films. Additionally, the tool can be used to create multi-layer stacks, allowing for the creation of specific, targeted film structures. All of these features make ANATECH Hummer VIII an excellent choice for the deposition of thin films.