Used ANATECH / TECHNICS HUMMER V #5717 for sale
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ID: 5717
Manually controlled tabletop sputter system
Process: depositing a conductive coating for visualizing SEM samples
Sputter deposition process is more uniform and reproducible
Yields more adherent films with finer grains than in evaporation systems
A bell jar will be installed on the tool
Internal pump: Mitsubishi Elec. Super Line, single phase induction motor, type SP-NRF
No targets included.
ANATECH / TECHNICS HUMMER V is a sputtering equipment designed to provide uniform layers of both organic and inorganic materials on flat substrates. It features a vacuum chamber and two sample holders, up to four sources, multiple process gases, and a wide range of sputter and deposition parameters. ANATECH HUMMER V utilizes an inverted magnetron technique (IMT), where cylindrical coils impart an axisymmetric magnetic field to the sputter target and the sputtered material is collected in the middle of the magnetron. The IMT technique provides improved plasma uniformity compared to traditional DC sputtering. Additionally, TECHNICS HUMMER V also features low current and low voltage operation, allowing for greater control over the sputter process. As a DC magnetron sputtering system, HUMMER V has a number of benefits over other sputtering techniques. Most notably, the low current operation allows for low-stress implantation, which can significantly improve adhesion of materials to the substrate. Additionally, the multiple gas delivery unit provides fast, repeatable processes with consistent results every time. By utilizing multiple gases, the sputter source is able to provide both reactive and non-reactive sputtering, allowing for the deposition of a wide variety of materials with different properties. ANATECH / TECHNICS HUMMER V is designed to provide a wide range of operating parameters and options, allowing for a variety of applications. In addition to its DC sputtering machine, ANATECH HUMMER V features a multiple ion source, enabling the creation of both twin-peak and custom profiles of implanted material. By utilizing the multiple ion sources, TECHNICS HUMMER V also makes it possible to deposit noble and non-noble layers, as well as complex, multilayer structures. The tool is designed to support a wide range of substrates, including silicon, metals, and other material systems. HUMMER V is an ideal choice for any application requiring deposition of organic and inorganic material layers on various substrates. Thanks to its unique ion sources and low current operation, ANATECH / TECHNICS HUMMER V can provide uniform layers with improved adhesion and repeatable processes. With its wide range of operational parameters, ANATECH HUMMER V is an excellent asset for a range of applications, providing the ability to deposit a variety of materials with a consistent, uniform layer.
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