Used ANATECH / TECHNICS Hummer #9004968 for sale

ANATECH / TECHNICS HUMMER is a sputtering equipment designed for the most demanding thin film research and deposition applications. The system offers a customizable platform with modular configurations that can be tailored for specific process needs. The unit includes an integrated sputtering source, a single source holder, an adjustable substrate holder, a closed-loop chamber/process control monitor, and a gas inlet machine. The integrated sputtering source is designed to provide a pulse DC source with a continuous source of power that is adjustable from 0 to 300v DC, while the adjustable substrate holder is designed to provide the flexibility to move substrates up to 150mm in diameter with a special feature for angled wafers and substrates. The closed-loop chamber control monitor allows for closed-loop real-time process control and monitoring over a range of conditions such as pressure, temperature, and sputtering parameters. The powerful sputtering source is designed to provide a highly energized glow discharge plasma and an optimal sputter yield. The sputtering source can be customized for specific process needs, such as improved film uniformity and high throughput. The integrated gas inlet tool is designed to allow for easy introduction of gases without the need for additional components. ANATECH HUMMER asset has been designed to minimize the number of internal components that can cause contamination and ensuring a robust and reliable process. The model has also been designed to reduce particle formation and sputter yield non-uniformity. The equipment has adjustable safety parameters and a diagnostic warning system to ensure spray retardants or other safety critical systems are in operation at all times. TECHNICS HUMMER unit is a robust and reliable sputtering machine, providing the user with flexibility and control over the process and sputter parameters to achieve the desired deposition results. The tool includes an integrated sputtering source, single source holder, adjustable substrate holder, closed-loop chamber/process control monitor, and gas inlet asset, allowing it to be tailored to specific process requirements. The integrated safety parameters, diagnostic warning model, and adjustable sputter sources ensure maximum reliability and user satisfaction.