Used ANATECH / TECHNICS RF-2C #9213270 for sale

ANATECH / TECHNICS RF-2C is a medium-vacuum sputtering equipment, designed specifically for the deposition of thin films onto substrates. It is used for the precision deposition of metals, ceramic and composite materials with the help of a vacuum chamber. ANATECH RF-2C sputtering system is primarily used in research, thin-film deposition, surface engineering, and electronic component fabrication. TECHNICS RF-2C utilizes Radio Frequency (RF) power from a series of in-vacuum generating modules to create a strong magnetic field. This highly efficient and cost effective sputtering process uses high frequency to raise the energy levels of the ions in the plasma gas and accelerate them towards the target surface, resulting in the uniform deposition of thin films. Because it does not require high levels of vacuum, RF-2C requires less than one-third the energy of other sputtering systems. The unit is equipped with three magnetrons: a single and two dual magnetrons which include Titanium target and an Oerlikon magnetron. Various other substrate holders, process monitors and sensing devices are also included in ANATECH / TECHNICS RF-2C. The machine is capable of accommodating various types and sizes of substrates and targets. The components such as the Oerlikon magnetron can be customized to meet specific application requirements. In order to ensure precise control of the gas flow and the deposition parameters, the tool is outfitted with a vacuum chamber with integrated digital pressure, pressure-resistant ceramic rods, a mass flowmeter, and a gas mixing panel. ANATECH RF-2C is also equipped with programmable electric power, temperature and power regulation systems enabling users to easily monitor and control the process parameters. The state-of-the-art TECHNICS RF-2C asset is designed to maximize the efficiency and accuracy of thin-film deposition. Its excellent control features ensure uniform deposition of thin films without compromising on the quality or longevity. RF-2C is a reliable and cost-effective sputtering model, perfect for research and other commercial applications.