Used BALZERS BAS 450 PM #293650881 for sale

ID: 293650881
Co-sputtering systems (2) Power supply boxes Water supply Pumps Non-functional: Safety circuit Single switch.
BALZERS BAS 450 PM is an industrial grade sputtering equipment used in the fabrication of thin film structures. It is a powerful tool for coating materials onto substrate surfaces, allowing for the deposition of uniform and repeatable nanoscale layers used in the creation of various electronic, optical, and optoelectronic devices. BAS 450 PM has a compact design which features a well-ventilated chamber, making it suitable for use in a variety of settings. The chamber has three sputtering sources, allowing for a simple and efficient deposition process. The system also has a substrate heater which can reach temperatures up to 1000°C, allowing for precise control over the substrate temperature during sputtering. The unit features a powerful 300 W DC magnetron sputtering gun which enables ultra-fast sputtering rates, making it capable of depositing a range of materials. The gun can be configured for direct or indirect sputtering, depending on the requirements of the process. The sputtering gun is capable of generating a high-voltage plasma environment, facilitating materials deposition with high efficiency. BALZERS BAS 450 PM also has an optional turbo pump which offers a great improvement in machine sensitivity and substrate temperature control. The turbo pump also allows for higher grade filtration of evaporant particles as well as a reduction in chamber pressure. This makes the tool highly suitable for ultra-fine deposition of nanoscale structures. In addition, the asset is equipped with a drain which makes it easy to remove spent sputtering material. This feature increases safety by preventing any build-up of particles on the substrate or in the chamber. BAS 450 PM is also equipped with a shield which prevents stray particles from escaping the vacuum chamber. Overall, BALZERS BAS 450 PM is an excellent sputtering model for creating complex thin film structures with uniform and repeatable deposition. It has a powerful sputtering gun, an adjustable substrate heater, and a high-efficiency turbo pump making it suitable for a wide range of processes. The equipment also has a drain and shield to prevent any contamination, ensuring a safe and efficient operation.
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