Used BALZERS / EVATEC Clusterline 200 #9248388 for sale

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ID: 9248388
Wafer Size: 6"
Vintage: 2007
Physical vapor deposition system, 6" Can be configured for 4"-8" Supports thin wafers and warped wafers (6) Process modules: Degas module Au (gold) sputter Ti (titanium) sputter Ni (nickel) sputter Pd (palladium) sputter Ag (silver) sputter Includes: (2) Load lock cassette stations CTI-CRYOGENICS 9600 Compressors CTI-CRYOGENICS Cryo pumps on PVD chambers ADVANCED ENERGY Pinnacle DC power supplies (2) User interface stations: Front and rear Foreline vacuum pump Control rack: Power supplies Controllers AC Power distribution Signal light tower 2007 vintage.
BALZERS / EVATEC Clusterline 200 is a specialized sputter deposition equipment designed for industrial, academic and research applications. It was developed by the Swiss company EVATEC and utilizes a vertical configuration, allowing for a wide variety of coating configurations. The system is composed of a cluster of sputter sources, allowing for more precise control of thin-film thickness uniformity over large areas. Its chambers can be programmed to create any kind of coatings, from highly reflective layers to more protective coatings. EVATEC Clusterline 200 also includes an RF-couple plasma source, an optical emission monitoring for deposition rate control, and an in-situ end-point detector. BALZERS Clusterline 200's multi-source configuration offers several advantages, including superior adhesion, uniformity, and reproducibility. It also offers improved process homogeneity, enabling the deposition of thicker layers with exact control over the thickness profile. This feature grants more flexibility in terms of the choice of materials, allowing for a variety of sizes, materials, shapes, and topographies. The sub-millimeter accuracy of Clusterline 200 allows for better deposition results, with smoother, flatter, and even smoother surfaces. Additionally, the unit reduces coating thickness non-uniformities that can be caused by sputtered particles, due to its patented coating technology. Its high temperature and substrate heating capabilities, together with optimized gas flows, make possible to deposit films with high optical performances. Moreover, the machine comes with a wide variety of electrodes for different deposition goals. This means that the user can select the most appropriate material for their requirements, while monitoring the process parameters during and after each cycle. BALZERS / EVATEC Clusterline 200 is incredibly easy to use, and is compatible with a range of computer-friendly software tools. This allows users to monitor and control the tool remotely, giving them access to granular process data. A maintenance asset makes sure the deposition process is kept on safe mode throughout operation. High quality results and improved production performance are a guarantee with EVATEC Clusterline 200.
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