Used BALZERS LLS 801 #9240378 for sale

BALZERS LLS 801
Manufacturer
BALZERS
Model
LLS 801
ID: 9240378
Wafer Size: 6"
Metal sputtering system, 6" Chemicals: Cr, TiW, NiV, Au, SQ On board water pump.
BALZERS LLS 801 is a sputtering equipment designed for the production of a wide range of thin films and coating applications. It utilizes cathodic arc deposition (CAD) technology that provides high deposition rates with excellent material transfer, high film uniformity and highly precise control of film parameters. This system features state-of-the-art components and intuitive software that makes it a reliable, robust and highly efficient choice for research and production activities. LLS 801 is a simple, compact design that can be installed in a confined space. It has integrated vacuum components, including a turbo-molecular pump which can maintain a clean environment and a high level of vacuum. The unit also includes a gas box with valves and piping that enable the introduction of process gases into the vacuum chamber. Additionally, the temperature of the chamber can be adjusted by heating the walls. The machine is powered by an advanced, PC-based user interface that features intuitive programming, visualization and data acquisition tools. This can be used to precisely control and monitor a variety of parameters that affect the sputtering process, such as the power level, target composition, substrate temperature, source gas flow rate, etc. This helps to ensure uniformity within the sputtered films and improved repeatability. The tool is ideal for preparing thin films for a wide range of materials, including semiconductors, dielectrics, metals, insulators and polymers. The film deposition thickness, composition and structure can be fine-tuned, making it an excellent choice for a wide variety of industrial applications, from optoelectronics and display devices to energy storage and other microelectronic devices. BALZERS LLS 801 asset offers users the flexibility to create highly customized thin films. In addition, the model offers precise control over all depositing parameters and a high uniformity over the entire wafer. The equipment is easy to use, with user-friendly software and intuitive graphical user interface (GUI). This makes it highly suitable for both research and production environments.
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