Used BALZERS LLS EVO #9015975 for sale

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BALZERS LLS EVO
Sold
Manufacturer
BALZERS
Model
LLS EVO
ID: 9015975
Sputtering system Substrate: 4" (36 pcs) 6", (12 pcs) holder HV pump: CTI 8F OnBoard (LC / MC) Rough pump: TRIVAC D 65B (LC / MC) Polycold type: PFC 400 LT HV valve: VAT 014 2-POINT (LC), VAT 064 3-POINT (MC) Vent valve: VAP 025 / VAP040, Soft vent MFC 5 slm [N2] Heater: Heater shutter (LC) Etching in LC: RF sputter etch Electrical: 3 x 400 VAC, 60 Hz Power supplies: # 1, 2: DC 6 kW # 3: RF 2.5 kW Cathodes: Power supply #1: 1, 3 Power supply #2: 4, 5 Power supply #3: etch, 2 Target material: Ta: 1 SiO2: 2 Ta: 3 AlCu: 4 NiCr: 5 Manual handling Accessories: Second set of shields Second set of substrate tooling.
BALZERS LLS EVO is a sputtering equipment designed for advanced thin film applied research. This system offers innovative process solutions such as deposition, etching and patterning of thin films. It is suitable for a variety of materials and applications, including semiconductors, metals and insulators. LLS EVO is a versatile machine that features advanced software that offers users a wide range of sputtering and etching processes. It is easy to operate and customizable to meet a variety of sputtering processes. The unit has large chamber capability, which allows the user to achieve extremely uniform films over large areas. The principle behind BALZERS LLS EVO sputtering machine is to utilize a gas-phase process in order to provide better surface area and lower temperature processing. This process is achieved by introducing inert gases such as argon, krypton, nitrogen, and xenon into the chamber. These gases are accelerated to about 700 m/s in the chamber and collide with the sputtering target. This causes the target to become charged and the inert gases are ionized, resulting in an electrical plasma from which sputtering is initiated and films are deposited on the substrate. LLS EVO sputtering tool can deliver films with extremely high quality and high uniformity. It also allows deposition of films at different rates, depending on the target material and the type of coating being applied. The asset is designed such that the deposition rate can be varied to meet the demands of specific applications. BALZERS LLS EVO also offers users the ability to fabricate thin films with high precision. For example, the atomic layer deposition (ALD) process permits high deposition rate and extremely uniform thin films with excellent film quality. Additionally, the optical and tunneling microscopy associated with the model allows for accurate and precise monitoring of surface and interface structures. To sum up, LLS EVO sputtering equipment is a powerful tool for thin film research and development. It is designed to offer users a wide range of versatile sputtering and etching processes and ensures uniform and high-quality thin films. The system also features advanced software and allows the user to fabricate thin films with high precision.
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