Used BALZERS ST 801 #9200579 for sale

BALZERS ST 801 is a Pulsed DC sputter equipment designed and manufactured by BALZERS, a renowned manufacturer of thin film deposition equipment. ST 801 system is designed to efficiently sputter thin films for a wide range of applications. It offers a high level of control and precision, with the ability to sputter up to 8 targets of various materials onto substrates as well as two electron beam guns. It also allows for easy process optimization, with a real-time graphical user interface to monitor the process parameters. BALZERS ST 801 features a very large vacuum chamber, which is capable of sputtering up to 8 targets. The chamber pressure can be maintained between 1 to 1E-5 hPa. The unit also includes a turbomolecular pump for fast pump down and precise control of chamber pressure. This machine is capable of generating a full range of reactive as well as non-reactive sputtering techniques, including reactive direct-current (DC) sputtering, as well as high-density plasma-enhanced DC (HiPED) and magnetron sputtering. ST 801 also features a highly advanced, user friendly real-time graphical user interface (GUI). This user-friendly interface provides easy access to major parameters, such as target thickness, current, power and frequency settings, as well as other operation parameters. In addition, the GUI includes dedicated jogwheels to fine-tune the selected operation parameters, which can help to quickly and precisely optimize the sputtering process. BALZERS ST 801 also features two electron beam guns, which provide high resolution, high speed sputtering of very thin layers. These guns can also be used for high resolution etching applications. The guns are capable of producing fine patterning on various kinds of substrates, such as metals, silicones and semiconductors. ST 801 sputtering tool provides reliable performance and operational simplicity, making it suitable for both industrial and research applications. The asset is designed for ease of use and allows for fast, precise and cost-effective sputtering process optimization. This model is ideal for those who want to precisely control their thin film deposition process and need high quality thin film results.