Used BUHLER / LEYBOLD OPTICS Star #9244433 for sale
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ID: 9244433
Sputtering system
Loading capacity: (2) Pair of lenses
Maximum substrate Ø: 80 mm / 3.15"
Process gases: N2, O2, Ar
Remote access: LAN / WLAN / Air card
Cycle time (4-Layer AR): 10 min
Sputter target: Silicon (Si)
Sputter power supply: DC Pulsed
Sputter rate SiO2: 1.2 - 2.0 nm/s
Sputter rate Si3N4: 0.7 - 1.2 nm/s
Includes:
LEYBOLD OPTICS PK150 Cathode
Electrical cabinet
Sputter cathode
Substrate lift device
Substrate rotary drive
Turbo pump
Water chiller
Mechanical pump
Handling system
Gate valve
Shutter
Cathode: Swiveled 90° up
Operator terminal
With touch screen interface
Process chamber / Load lock
With entry load lock chamber
Electrical supply:
Electrical cabinet
Power supply for sputter source
Media supply:
Process gasses
Water chiller
Power and compressed air.
BUHLER / LEYBOLD OPTICS Star is a high-precision vacuum-based sputtering equipment designed to deposit thin-film coatings on flat and curved surfaces. The system offers superior substrate-to-target distance adjustment, with a range of +/- 6 mm and a step resolution of 0.5 mm. It also incorporates an advanced closed-loop feedback unit with three separate channels to enable precise control of the sputtering process. The machine utilizes a high vacuum chamber with automated processes to allow efficient and safe operation. The maximum sputtering pressure is 1 mbar and the tool maintains the pressure using a turbo molecular pump. The chamber temperature is maintained in the range of -30°C to 150°C with a 0.1°C accuracy. The asset utilizes a 'magnetron-based' sputtering source and 'diode-based' sputtering source for efficient film deposition. Both sources allow for adjustable sputter rates and pulse durations for high accuracy deposition. Additionally, the targets can be tilted (±20°) for obliquely sputtered deposits. The model also includes an advanced in-situ monitoring equipment to measure the sputter rate and film thickness. The in-situ monitor uses laser-based techniques to measure the film thickness on the substrate in milliseconds. Additionally, the system can be integrated with in-target chemical composition analysis, using a transverse spiral dual fitting technique to measure composition in real-time during continuous sputtering. The unit is designed to operate in a single or multi-position modes, allowing for simultaneous deposition on multiple substrates. It can also be used for sequential layered deposition, alternating between sputter and ion beam sources. The modularity of the machine also makes it easy to integrate additional components, such as a load/unload station, to further increase efficiency and throughput. BUHLER Star is designed to meet the demanding requirements of in-depth precision sputter coating, particularly in industries such as optics, electronics and aerospace. The tool is reliable and easy to use, providing an ideal platform for film deposition.
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