Used CANON / ANELVA 1060 SV2+1 #9210357 for sale

CANON 1060 SV2+1 is one of the most advanced sputtering systems on the market. It is designed for ultra-high rate film growth and deposition processes. It is a multi-source sputtering equipment that utilizes two cathodes and one raised descum crucible. The two cathodes can be either Magnetic (MP) or Planar (PP) type. The raised descum crucible enables the system to coat both sides of substrates with different materials in a single cycle. The 1060 SV2+1 has a wide range of applications including display, semiconductor, photovoltaic (PV), and optoelectronics industries. It is capable of sputtering complex patterns of multi-layer film stacks for surfaces with great uniformity and precise control over thickness, composition, and layer profile. The unit is also particularly suited for the deposition of nitride films. The 1060 SV2+1 utilizes advanced in-situ monitoring and control systems to ensure substrate quality and integrity are maintained throughout the entire deposition process. It employs an integrated closed-loop machine to monitor and control the various substrates parameters such as pressure, temperature, power, voltage, and current. The tool also has an advanced vision asset which captures high-resolution images of the substrates and allow for quick and accurate process adjustments to ensure uniformity and reproducibility. The model also incorporates an automated load lock which reduces contamination of the work chamber between the substrate exchange and process steps. By avoiding manual intervention and step purges, it ensures a clean and fast transfer from the load lock to the deposition chambers. The 1060 SV2+1 also offers an optional low temperature pre-sputtering process. This process can be used for post-etch cleaning, high-resolution patterning, and other steps which require low temperature processing. Overall, ANELVA 1060 SV2+1 is a high-performance sputter equipment that is widely used in many industries due to its precise control, wide range of applications, and in-situ monitoring and control systems. It offers fast, efficient, and reliable processing for a wide variety of materials and substrate sizes. The system is capable of providing superior results and is highly recommended for any deposition process.