Used CANON / ANELVA 1060 #9135855 for sale

CANON / ANELVA 1060 sputtering equipment is a high-performance system designed to create thick, uniform thin-films on samples for semiconductor processing. This unit utilizes sputtering, a physical vapor deposition method, to deposit thin layers of material onto the surface of a workpiece. The cathodes used in CANON 1060 produce gas discharges that bombard the sample surface with thermal energy, atomizing a surface and creating the desired thin film. ANELVA 1060 is a single magnetron sputtering tool, powered by a 4 kW DC power supply. It has two ceramic enclosures that house the process chamber and support chamber, and a top-loading capability for easy sample access. The processing chamber is capable of operating at temperatures of up to 400C and can achieve pressures up to 1 Pa. The maximum voltage is 3500 V and the frequency range is 5-250 kHz. The machine also includes a variable RF target power supply with a range of 100-1000 watts and a 6-stage power supply. 1060 has a variety of features that make it a versatile and reliable tool. It includes an automated target-rotation motor and can be easily configured to operate multiple magnets for sputtering multiple targets. The tool is equipped with a built-in gas box to provide controlled atmospheres necessary for PVD processes, as well as a particle monitoring asset to detect and track any sub-micron particles that contaminate the deposition chamber, an electrostatic chuck (ESC) to hold samples during processing, and a measurement/control device to measure and record parameters like temperature and pressure. CANON / ANELVA 1060 also features a number of safety features, such as an automatic shutoff switch for the DC power supply, an emergency stop button, a current sensor safety cut-off circuit, and a built-in emergency gas shutoff valve. These safety measures help protect users from potential damage and ensure the model functions properly. Overall, CANON 1060 is a powerful and reliable sputtering equipment, providing a versatile and efficient means of creating thin layers of material on substrates for semiconductor processing. It has many features that enable precise thin-film deposition and performance, and the built-in safety measures make it safe and easy to use.