Used CANON / ANELVA 1060 #9155413 for sale

CANON / ANELVA 1060 is a high performance sputtering equipment designed for research implimentations. This unique Abrupt Angle Magnetron Sputtering (AAM) system enables researchers to deposit ultra-thin films of desired material onto substrates with accuracy and repeatability. The unit utilizes a completely closed LT sputter chamber which consists of source, target, substrate, and control module, and is capable of volumetric deposition of materials in a variety of chamber sizes and shapes. It also has the capability to sputter in either magnetic or planar configurations to obtain the desired deposition profile. The machine is equipped with an ABRUPT type of AC plasma source and allows for quick and easy switching between different materials. This combination of magnetic plasma source and planar geometry ensures that the material is deposited in an even and consistent manner on the substrate. CANON 1060's unique design also enables greater control over the deposition process. It is possible to precisely control the cathode potential with an integrated two-channel power supply, allowing the precise amount of material to be sputtered under different conditions. The tool also has an adjustable RF power supply, designed to improve the uniformity of the deposited film. Additionally, the asset is equipped with an active filter, designed to remove particle contamination from the atmosphere, improving the uniformity of the sputtered film. Overall, ANELVA 1060 is an advanced sputtering model that is highly capable of manufacturing thin films with desired properties and uniformity. It is designed for a variety of research applications, from industrial to scientific, making it an ideal choice for anyone looking for a reliable and dependable sputtering equipment. Its innovative design allows for precise control over the deposition process, ensuring consistent high-quality films. 1060 is an ideal choice for anyone looking for a cutting edge sputtering system for their research or production needs.