Used CANON / ANELVA 7100 GT #9398911 for sale

CANON / ANELVA 7100 GT is a sputtering equipment designed to quickly and efficiently deposit thin films on various substrates. It utilizes a multi-target platform capable of accessing up to four targets and processing substrates up to 8 inches in diameter. The system is also capable of processing large-area substrates via scotch tape masking and shadow effect masking. The main components of CANON 7100 GT include an electronic chamber, a vacuum chamber, a process controller, an agitational puck, and an exhaust chamber. The electronic chamber is responsible for controlling the high voltage needed for sputtering. The vacuum chamber is the area where the sputtering takes place and also contains the targets and substrate. Additionally, the vacuum chamber is equipped with a cold cathode and switched magnets to ensure a uniform deposition. The process controller provides control data for the sputter process and monitors the unit for proper functioning. The agitational puck assists in agitation, positioning and cassette loading. Lastly, the exhaust chamber filters the gaseous byproducts of sputtering. ANELVA 7100 GT can deposit materials such as aluminum, chromium, gold, and titanium, as well as alloys composed of these elements. The deposition rate of these materials can be altered to suit the desired effect by adjusting the operating power. Furthermore, the sputtering process temperature can be set anywhere between room temperature and 350-400°C to optimize the deposition quality. 7100 GT also offers various operation modes to cater to different users needs. These are manual mode, which allows the user to easily control the entire sputtering process; program mode, which automates the entire process and is ideal for large area films; and semi-automatic mode, which is ideal for small area films and substrate positioning. In addition, the machine can also be linked to a computer for remote monitoring and control of parameters. Overall, CANON / ANELVA 7100 GT is an advanced sputtering tool ideal for the deposition of thin films on various substrates. Its multi-target platform, variable power and temperature settings, operation modes, computer link and exhaust chamber make it a great choice for both research and industrial applications.