Used CANON / ANELVA C-7100 #9153006 for sale

CANON / ANELVA C-7100 Sputtering Equipment is an advanced thin-film deposition system for deposition of film layers on substrates. It is used in the fabrication of thin-film optical and optoelectronic devices, such as thin-film transistors (TFTs). The unit features a variety of choices for deposition parameters, such as power source (DC, pulse DC, and radio frequency), target exposure area, target composition, etc. The machine is designed to handle substrates up to 200 mm in diameter, large enough for most industrial applications. CANON C7100 tool is built to provide a superior quality film deposition process under cost-effective conditions. It utilizes two types of sputter sources: a multi-target magnetron sputter source and a high-density diode sputter source. The magnetron sputter source is capable of depositing films of enhanced electrical conductivity. The diode sputter source offers superior deposition rate and uniformity. Both sputter sources can be programmed separately with different deposition parameters to achieve the desired film properties. ANELVA C 7100 includes a multi-zone vacuum chamber with evacuation to a pressure of 1×10-3 Pa. The asset is equipped with a built-in heat treatment oven for post-deposition treatment of film layers. In addition, the model is compatible with a variety of gas delivery systems, such as surface pre-treatment and gas introduction. The equipment utilizes an intuitive touchscreen graphical user interface (GUI) for ease of operation. The GUI provides all the options necessary to control the system parameters, monitor the unit variables, and capture data. The machine also includes an automated recipe storage tool for easy recall of previously saved operating conditions and recipes. CANON / ANELVA C7100 is capable of a number of advanced processes, including the plasma-assisted deposition of films and the formation of etching masks. It offers multiple deposition rate and uniformity monitoring, multi-point sputter target mapping capabilities, and pre-set substrate loading and unloading. The asset is designed to be environmentally friendly and features an integrated turbomolecular vacuum pump and a low power consumption mode. CANON / ANELVA C 7100 is a powerful and cost-effective sputtering model for achieving excellent thin-film deposition quality. It offers excellent deposition uniformity and a wide range of process capabilities. Furthermore, the intuitive touchscreen user interface makes the equipment easy to use and program.