Used CANON / ANELVA C-7100 #9154703 for sale
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ID: 9154703
Wafer Size: 8"
Vintage: 2009
Sputtering system, 8"
(3) Chambers
2003 vintage.
CANON / ANELVA C-7100 is a high-end physical vapor deposition equipment known for its quality thin-film deposition capabilities. This system utilizes dual-cathode magnetron sputtering with numerous features which make it suitable for a wide range of applications. The main body of CANON C7100 includes a chamber, with various components located inside. This chamber is nitrogen gas tight, thus enabling fast deposition processes due to its efficient extraction of reaction by-products. An ionization gauge maintains a sphere of ions around the work piece, ensuring high surface purity. It also features a turbo molecular pump which can evacuate the chamber to a pressure of approx 1x10^-5 Torr or higher. This unit was designed to process various substances with ease. Its standard configuration provides for depositing pure metals, alloys, and compounds, ceramic materials, and organic materials. In addition, its retractable platform enables a high-resolution top-view observation of the process. Versatile settings are also made available, so that anode and cathode parameters can be independently adjusted. ANELVA C 7100 has built-in processes for controlling the film deposition on the work piece, along with remote control features like on/off commands, and a cycle start control. It also includes cooling and heating functions, which allow for temperature control that is critical for the maintenance of a constant process in the chamber. This facility further enables the deposition process to be finely tuned according to the type of substrate, deposition mode, and process temperature. Overall, ANELVA C-7100 machine is a highly advanced and reliable sputtering tool suitable for thin-film deposition of various substances. Its unparalleled quality and precise film deposition, as well as its efficient handling of various parameters, make this a highly sought-after and reliable tool in the industry.
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