Used CANON / ANELVA C-7500L #293731713 for sale

CANON / ANELVA C-7500L sputtering equipment is an ultra-high vacuum instrument used to deposit thin films for thin film structures. It is mainly used for semiconductor device fabrication processes such as memory devices, durable electronics, solar cells, and flat-panel displays. It is one of the most efficient sputtering systems available today, due to its advanced automation and controls, which allow for time-saving, precise, and reliable thin-film deposition. CANON C-7500L has two sputtering chambers, each with three separate targets of different metals and alloys. This allows for the deposition of multi-layer, highly complex structures with exacting precision. It also allows for the deposition of films with properties that are not achievable with standard sputtering systems. The major components of the sputtering system include the plasma generator, the ion source, and the sputter gun assemblies. The plasma generator creates an ionized gas or plasma, which is then directed to the substrate by the sputter gun. The ion source is used to provide ions for the sputtering process, and the sputter gun assembly includes an anode, cathode, magnetron, and power supply. ANELVA C-7500L also features a wide range of process parameters that can be adjusted such as the RF generator power, the sputter times, the gas pressure, and the substrate temperature. This makes C-7500L ideal for R&D purposes, since sophisticated films with many composition and thickness layers can be produced with high precision. CANON / ANELVA C-7500L has a high-throughput rate, allowing thin films to be deposited at a faster rate compared to other sputtering systems. In addition, the unit's software is highly user-friendly and provides a number of analytical and control features. The machine also contains a powerful data logging tool, which allows users to easily collect and analyze thin film data. Overall, CANON C-7500L is a versatile and efficient ultra-high vacuum sputtering asset that is perfect for research and development. It is capable of producing films with properties not achievable with standard sputtering systems and features programmable process parameters for fast, precise deposition. Its software is highly user-friendly and its high-throughput rate makes it an ideal choice for thin film deposition.