Used CANON / ANELVA C-7540HCL #9031243 for sale

CANON / ANELVA C-7540HCL is a sputtering equipment designed to deposit metal or dielectric layers onto the surface of various materials, such as semiconductors, metal parts, polymer films, and wafers. The system utilizes a process called magnetron sputtering, and is capable of depositing materials at extremely high temperatures, up to 350°C. The unit is also equipped with a high-level multi-axis machine and uses a multi-frequency, dual-source power supply to deliver increased uniformity and deposition rates. The advanced features of CANON C-7540HCL make it ideal for use in the production of precision parts and components, as well as for creating layers of thin films. The tool consists of a sputtering source, a high-speed multi-axis processing chamber, an auxiliary material handling asset, and a control model. The sputtering source works by depositing a vacuum-generated metallic or dielectric layer onto a substrate using a cylindrical target. The high-speed multi-axis processing chamber then heats the substrate and targets to enable the deposition of materials. The auxiliary material handling equipment facilitates the loading and unloading of substrate material into the system. Finally, the control unit allows for precise control over the deposition process. ANELVA C-7540HCL is able to produce precise thin film layers with a high degree of uniformity. It can also deposit a variety of metals and alloys, and is capable of creating fine lines, grooves, and patterns with accuracy and speed. In addition, the machine is equipped with several safety mechanisms, such as an emergency stop switch and a coolant-pressure-monitoring tool. C-7540HCL is a reliable asset that is capable of producing high-quality, precise thin film layers. It utilizes advanced processes and high-performing components to ensure the quality and efficiency of the deposition process. The model's excellent features and safety mechanisms make it suitable for manufacturing applications in numerous industries.