Used CANON / ANELVA C-7730FH #9167769 for sale

CANON / ANELVA C-7730FH is a sputtering system designed to coat thick films of various materials on substrates. It utilizes a high vacuum chamber and magnetron sputtering for deposition. CANON C-7730FH is highly customizable depending on the application and deposition material. It features a Programmable Coaxial System (PCS) allowing for different types of magnetron angles. It also is equipped with multiple deposition sources, including a thermal evaporation source, to allow for multiple layer deposition. ANELVA C-7730FH utilizes an advanced Turbo Molecular Pump (TMP) to create vacuum in the chamber allowing for the sputtering process to take place. The TMP is capable of achieving a range of pressures from 2 x 10-3 Pa to 5 x 10-5 Pa. This range of pressure allows for various types of deposition processes that could not be performed otherwise. C-7730FH is capable of creating a range of film thickness of between 1 nm and 200 nm. This can be achieved through sputtering processes at different power settings. The PCS allows for a precise amount of control when sputtering since the magnetron can be set at different angles and positions within the chamber. CANON / ANELVA C-7730FH includes a high degree of analyzing capability, which is required for advanced sputter coating processes. It is equipped with a Spectrometer, which can measure the composition of the films. It also is equipped with a Quartz Crystal Microbalancer, which can measure thickness and homogeneity of the deposited film. This information can be used to fine-tune the sputtering process to create exactly the needed film thickness and composition. Due to its high degree of customizable features, CANON C-7730FH can be highly tuned for a variety of applications. It is capable of depositing thick films made of different material composition for use in applications such as semiconductor devices, optical and mechanical components, and other electronics-related components.