Used CANON / ANELVA C-7730FH #9167770 for sale

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CANON / ANELVA C-7730FH
Sold
ID: 9167770
Wafer Size: 5"
Sputtering system, 5".
CANON / ANELVA C-7730FH is a sputtering equipment designed for thin film deposition. It is capable of depositing a range of thin films ranging from conductors to semiconductors as well as a variety of optical materials. At the core of CANON C-7730FH system is the cathode, which is used to initiate the ionized gas that drives the sputtering process. This ionized gas is then accelerated by an electric field and directed to the target material. Once the ions hit the target material, they cause the material to be dislodged and then deposited onto the desired substrate below. ANELVA C-7730FH is designed to be an efficient sputtering unit, with the ability to uniformly deposit materials and maintain a consistent sputtered material rate for a long period of time. C-7730FH has a wide range of features that makes it convenient and effective for thin film deposition. The machine is equipped with an adjustable rotating sputter head that allows for the deposition of uniform films onto large substrates, and the tool is equipped with an 'anti-squeegee' feature that reduces surface electron defects and homogenize thin films. It also has a high power supply that allows for increases in sputtering power to achieve faster production rates. Another practical feature includes a variety of funnel shapes for targeting specific areas. The asset includes an onboard computer which controls the entire deposition cycle, from the loading of the target material and positioning of the sputter head, to the selection of sputtering parameters and recipe control. This computer is also capable of storing a range of customized recipes, making it easy to adjust parameters to suit specific applications. CANON / ANELVA C-7730FH also includes a variety of diagnostics features to ensure high levels of quality control. This includes the ability to detect data such as sputtering power, temperature, and chamber pressure and also the ability to analyze signals from the deposition graph. This allows for simple and efficient monitoring of the model and helps to ensure that substrates are compensated accurately and consistently. CANON C-7730FH is a versatile sputtering equipment designed to provide high-quality thin film deposition for a range of applications. It provides efficient production rates, is equipped with a variety of features designed to increase uniformity and homogeneity of deposited films, and its onboard computer allows for easy recipe customization and quality control monitoring.
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