Used CANON / ANELVA E-730S-FH #9167771 for sale

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CANON / ANELVA E-730S-FH
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ID: 9167771
Wafer Size: 5"
Sputtering system, 5".
CANON / ANELVA E-730S-FH is a sputtering equipment designed for use in semiconductor manufacturing. This system is capable of sputtering both dielectric and metal layers on wafers. It can also sputter ceramic and alloy layers. CANON E-730S-FH allows users to easily control the process parameters, such as gas pressure, Argon (Ar) pressure, temperature, and pressure of deposition gases. These parameters can be adjusted to meet the user's needs. The unit also features a pulse etching feature, which allows users to adjust pulse etching to optimize their deposition rate. ANELVA E-730S-FH features a sputtering chamber with a diameter of 960 mm. This allows for sputtering of large wafers up to 13 inches (312.85 mm) in size. The machine also features a dual-frequency power supply capable of supplying up to 4.2kW. This power supply can be used to generate both DC and high frequency RF sputter deposition. E-730S-FH is designed to provide high quality, reliable, and efficient sputtering. It is equipped with a closed loop gas control tool to ensure that the desired process parameters are maintained throughout the sputtering process. This asset can be used to sputter various materials, such as aluminum, copper, chromium, tantalum, and thin films. This model also features a vacuum control equipment, which helps to ensure high purity of the deposited material. The system is designed to avoid air pumps from degrading the deposition rate, and is also designed to limit dust buildup in the vacuum chamber. CANON / ANELVA E-730S-FH is equipped with both visual and audible alarms. If something goes wrong during the process, operators can easily monitor the state of the unit with the alarm indicators. The machine also enables users to chain multiple systems together and safely run them in an automated manner. This feature allows multiple sputtering systems to run simultaneously while ensuring that all parts are running correctly. This feature can help improve efficiency and reduce sputtering costs. Overall, CANON E-730S-FH is a reliable and efficient sputtering tool capable of producing high quality deposition layers. This asset is available for both research and manufacturing applications.
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