Used CANON / ANELVA EVC-1501 #9031250 for sale

CANON / ANELVA EVC-1501 is a high-vacuum sputter deposition equipment used to deposit high quality, evenly distributed thin films to the surface of a substrate. It is designed for very demanding industrial and research applications, such as printed electronics and OLED displays. The system is equipped with a load-lock chamber, which provides a low pressure environment during the process, enabling the sputtering process to take place in controlled conditions. CANON EVC-1501 can operate in either planar or rotary sputtering mode, and is capable of both single- and multiple-target sputtering. The unit has a multi-zone process chamber, called the Variable Control Zone (VCZ), which allows the user to control the intensity and uniformity of the coating created. The VCZ is able to shift the position of the substrate relative to the target, thus enabling the sputtering process to be customized as per the user requirements. The machine is equipped with a high-force DC magnetron sputtering source, which is capable of creating thin film coatings with superior adhesion and uniformity. It has an extended service life due to its low-intersputtering design and is able to operate at high deposition rates. The tool has a 2.4kW RF power amplifier for sputtering, with an adjustable power range of 30-150 V. It is also equipped with a variable-frequency generator for increased precision and control over the sputtering process. The asset also comes with automatic gas control, enabling precise control over deposition gas flow. Additionally, the model has a shuttle carrier, allowing substrates to be transferred quickly and easily. It is also equipped with a computer-controlled equipment, offering easy access to the software, network and peripheral control. The system also has a nitrogen purge function, ensuring proper post-sputtering cleaning of the chamber. To conclude, ANELVA EVC-1501 represents and cost effective and reliable solution for sputtering thin films on substrates for industrial and research applications. It is distinguished from typical sputtering systems due to its impressive load-lock chamber, variable control zone, adjustble power amplifier, automatic gas control, shuttle carrier and computer-control unit. All these features result in a cost-effective, high-performance sputtering machine that is well suited to the requirements of today's demanding research and industrial sputtering needs.