Used CANON / ANELVA EVC-1501 #9048865 for sale

CANON / ANELVA EVC-1501 is an advanced, high precision sputtering equipment, that is capable of precise metal or dielectric thin films deposition. It utilizes advanced features such as an improved deposition rate and quality, thanks to a sub-micron layer thickness accuracy which is adopted for electronic, optoelectronic, and MEMS applications. This sputtering system utilizes an electron beam gun for mass neutralization and an electro-magnetic environment control (EMEC) unit, which allows its sub-micron layer thickness consistency. The deposition rate is high, with a steady-state working pressure around 0.1 mBar to 1 mBar, and a maximum target current of 150 mA. Furthermore, the insulation voltage is adjustable from 0 to 150 V, allowing you to adjust the thickness and uniformity of the coating as required. Furthermore, the deposition can be performed in reactive or non-reactive atmospheres, with a capability of up to 15 units room temperature operation. The machine also comes with high-performance high-vacuum turbo-molecular pump which provides a fast, efficient evacuation rate to the operating chamber. Additionally, the tool features an advanced particle monitor and pump-down monitor which provides high-level control over the evacuation process. This aids in the accurate and reliable deposition process. CANON EVC-1501 also features a high-rate output pulse generator, allowing the user to implement fast pulse sputtering. It further permits the user to employ various pattern control capabilities such as oxide-nitride thin film deposition, grain size control, and dielectric property control. Overall, ANELVA EVC-1501 sputtering asset is an advanced and precise sputtering model designed for the deposition of metal or dielectric thin films. It features a number of advanced features for improved deposition rate and quality such as an improved sub-micron layer thickness accuracy, adjustable insulation voltage, and premium-quality vacuum turbo-molecular pump for efficient evacuation. It further permits a number of properties to be applied, allowing for high layer uniformity and a broad range of applications.