Used CANON / ANELVA EVC-1701 #9181769 for sale

CANON / ANELVA EVC-1701 sputtering equipment is a high-tech, automated system designed to produce films of various metals and materials for use in industrial applications. This unit is a combination of CANON sputter deposition technology and C-1701 vacuum deposition controller for optimized performance. It features advanced sputtering technology, including a dual-magnetron configuration, for both planar and convex surface applications. CANON EVC-1701 is capable of producing films with both low and high deposition rates for various device structures. The machine is designed to operate under ultra-high vacuum (UHV) conditions and can handle a wide range of sputtering chemistries and substrate temperatures. The built-in devices allow for accurate monitoring and control of critical parameters, such as sputter rates, gas flow, rate of ionization, film thickness, and deposition rate. The tool is equipped with a range of specialized accessories to facilitate optimal customization of sputtering processes. These accessories include a range of substrates, a substrate heater, collimator, target and backing plate. The substrate heater allows for precise control of substrate temperatures and can reach temperatures up to 350°C. The collimator is used to control the shape and area of the sputter plume. ANELVA EVC-1701 also features a sophisticated gas delivery asset for optimal control of the sputtering process and results. The automated gas box is designed to produce both low and high-pressure sputtering conditions, reliably meeting the requirements of different sputtering processes and film deposition rates. Overall, EVC-1701 is a compact and efficient model for producing quality devices. It is designed with advanced sputtering technology and allows for reliable control of the deposition process. The equipment is conveniently customizable and easy to use. With its automated gas delivery system and built-in devices, CANON / ANELVA EVC-1701 is ideal for use in sophisticated industrial applications and device fabrication.