Used CANON / ANELVA EVC-1701 #9240310 for sale

CANON / ANELVA EVC-1701
ID: 9240310
System.
CANON / ANELVA EVC-1701 is a highly advanced sputtering equipment that is used for thin film deposition and coating operations. It is the ideal deposition system for building up materials on surfaces in a precise, controlled and efficient manner. The unit consists of a number of key components and features, including: - Sputtering Gun: The sputtering gun is the core component of the machine, and it is responsible for ejecting ions, atoms, and other particulates onto the surface of the substrate in order to form a thin film. The gun can be moved both horizontally and vertically in order to control the angle of deposition. - Vacuum Chamber: The tool is equipped with a vacuum chamber, which can be heated or cooled in order to produce the desired environmental conditions for the deposition process. This chamber is also sealed in order to provide a completely isolated working environment for the asset. - Process Gases: Process gases such as Argon and Oxygen can be used to control the deposition process, as well as to create an inert atmosphere inside the chamber for optimal conditions. - Substrate Sample Chamber: This chamber is used to house the sample material that will be coated or deposited on. It is adjustable in order to accommodate different sizes and shapes of samples, as well as to provide access to the chamber when necessary. - Power Supplies: The model is powered by a number of high-voltage power supplies. These supplies are responsible for controlling and regulating the current and voltage that is applied to the sputtering gun in order to achieve the desired results. - Computer Control Equipment: CANON EVC-1701 is equipped with a computer control system, which allows the user to set up and monitor the processes involved in the deposition process. This unit can be programmed to conform to specific requirements and can even be programmed to shut off the machine if something goes wrong. In conclusion, ANELVA EVC-1701 is an extremely versatile and precise sputtering tool. Its components and features are designed to help aid in an efficient and effective deposition process, while also providing a level of safety and control. As such, this asset can be relied upon for high-quality results in a variety of aerospace, semiconductor, and research applications.
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