Used CANON / ANELVA EVC-1701 #9269417 for sale

CANON / ANELVA EVC-1701
ID: 9269417
Evaporation system.
CANON / ANELVA EVC-1701 is a sputtering equipment designed for thin film deposition. It features an advanced direct current (DC) sputtering power supply and innovative shape-forming control technology, allowing it to produce high-precision thin films for small components and devices with uniform thickness. The sputtering system is capable of deposition of materials driving by both magnetic and magnetron sputtering processes. The power supply enables users to precisely control the deposition rate, producing thin and uniform films. This control is possible due to the incorporation of a closed-loop unit with an onboard pulse generator. The pulse generator is supported by an Active Beam Control (ABC) machine which measures the exact voltage during the deposition process for accurate and reproducible thin film deposition. CANON EVC-1701 also offers magnetron sputtering technology so users can precisely control the films' characteristics and shape. Magnetron sputtering is a more advanced sputtering process than DC sputtering because it can form more angular shapes on the substrate surface. This technology can mainly be used to produce metallic thin films, such as copper and aluminum, without alteration of film composition. The tool offers support for different scope of applications ranging from large substrates to complex shapes and geometries. It is compatible with CANON Monacloud Series substrates ranging from large rectangular pieces and can also deposit thin film directly onto complex surface components in three-dimensional form. In addition to sputtering technology, ANELVA EVC-1701 has several other features including a built-in processing chamber, adjustable mass flow controllers for gas flow control, selectable gas flow delivered to the chamber, automated thermal management, and a user-friendly menu asset to easily set up the deposition process. EVC-1701 is an advanced sputtering model with a wide range of applications. Its precise control of deposition rate, uniform thin films and excellent shape control make it the ideal choice for a wide range of industrial and research applications.
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