Used CANON / ANELVA EVC-1701 #9282622 for sale

CANON / ANELVA EVC-1701
ID: 9282622
Evaporator.
CANON / ANELVA EVC-1701 is a high-level sputtering equipment that is designed to be used in the production of semiconductor devices. It utilizes advanced technologies to accurately deposit various materials onto the substrate, such as materials used for barrier and passivation layers. This system is designed with integrated automation features that ensure a consistent deposit rate and uniformity over large substrates. The unit is equipped with two large 6-pocketed rotating cathodes which can hold and sputter a wide variety of materials, such as aluminum, copper, zirconium, chlorine, and more. It also includes a high frequency magnetic field which helps to create and maintain a uniform depositing layer during the process. The machine includes a multi-disc Substrate Robotic Transfer Tool which accurately and quickly transfers substrates of various sizes and shapes from the main chamber to loading and unloading locations. This feature promotes optimal handling and efficient production of multiple substrates, ensuring minimal breakage and contamination. The asset is equipped with a high-precision wafer-orientation model that enables precise and exact placement of the wafer to the deposition sources. This helps to avoid physical damages from incorrect orientation or mis-alignment. Additionally, the equipment also features a built-in personal computer with a touch panel user interface to provide a straightforward, user-friendly experience. This system can also be integrated with an external computer unit, enabling remote operation and monitoring. Not only is CANON EVC-1701 machine highly accurate, but it is also energy-efficient. The tool is equipped with several energy-saving features, such as a movable shutter that limits the area of deposition and prevents stray plasma from entering the work area. This helps to conserve energy and reduce heat build-up in the asset. Overall, ANELVA EVC-1701 is an extremely reliable source for sputtering materials onto substrates for the production of semiconductor devices. It is highly efficient, accurate, and can accommodate a wide variety of materials. Its numerous automated features and energy-saving design make it an ideal choice for those looking for a cost-effective solution to their semiconductor production needs.
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