Used CANON / ANELVA I-1060 SVII Plus 1 #9018208 for sale

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CANON / ANELVA I-1060 SVII Plus 1
Sold
ID: 9018208
Wafer Size: 8"
Vintage: 1997
Sputtering system, 8" 1997 vintage.
CANON / ANELVA I-1060 SVII Plus 1 is a sputtering equipment designed for the production of high-performance surfaces and thin films. It is comprised of a high-energy ion source which is able to emit up to 10kV of either argon or xenon ions, a highly precise rotating production target, a rotating mount for the production target, a gas distribution module, a cathode, an anode, and a modern controller system. The unit's ion source has been optimized to maximize the ion-to-atom emission. It is capable of producing ion beams with a highly optimal density of 10^14 cm-2s-1 and a beam energy up to 10kV. The highly precise rotating production target ensures the uniform deposition of the material being deposited on the base material. The temperature and the atmosphere inside the chamber can be precisely set and controlled for different surface treatments, such as etching, deposition, cleaning and substrate pre-treatment. The machine is also equipped with a gas distribution module, which is responsible for the ultimate uniformity of the process gases. Various gases such as hydrogen, nitrogen, oxygen, argon, chlorine and xenon can be used for different processes, depending on the application and the base material. The gas line distribution is electronically controlled and enables a uniformity of gas distribution over the entire product. The tool also includes a modern controller asset which is connected to various external devices. The user-friendly interface provides real-time data monitoring along with a wide range of tools to help users achieve the desired parameters quickly and easily. The controller model also gives users the ability to program different recipes for different processes. CANON I-1060SVII PLUS-1 is ideal for sputtering thin film layers on substrates through various processes such as high-precision deposition, hard-coat, sputtering, chemical vapor deposition (CVD) and physical vapor deposition (PVD). It is designed to minimize residue and optimize the coating process. By providing an ideal combination of precision, control, uniformity, and accuracy, the equipment can be used to produce high-quality products in a variety of fields.
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