Used CANON / ANELVA I-1060 SVII Plus 1 #9120224 for sale
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ID: 9120224
Vintage: 1996
System
Configuration:
L1 Etch chamber
Turbo pump: Osaka TG-550
RF: WMA-1, double frequency
L2 Deposition chamber
Cryo pump: CAP83R
DC Power: PDC-870D
L3 Deposition chamber
Cryo pump: CAP83R
DC Power: PDC-609
R3 Deposition chamber
Cryo pump: CAP83R
DC Power: PDC-307E
R2 Despostion chamber
Cryo pmp: CAP83R
DC Power: PDC-307E
R1 Degas chamber
Lamp heater: 400°C
L/L Left chamber
Cryo pump: CAP83R
L/L Right chamber
Cryo pump: CAP83R
Includes:
Edwards dry iQDP80
Cryo compressor CRC 874
Main control rack
operation rack
RF Generator rack
DC Power supply rack
UPS PS1203
PVD Rack
1996 vintage.
CANON / ANELVA I-1060 SVII Plus 1 is a state-of-the-art multi-purpose sputtering equipment designed to carry out both physical and chemical sputtering processes. This high-performance sputter system is capable of producing a variety of applications for materials, such as thin films, multilayers and composites. It is ideal for use in industries requiring precision sputtering, such as MEMS (Micro-Electro Mechanical Systems) applications, semiconductors, sensors and optoelectronics. The unit uses a Medium Frequency Power Supply (MFPV), which is designed to reduce machine size while maintaining the highest possible microwave power output. This enables uniformity of the sputtering process, even at high sputtering rates. CANON I-1060SVII PLUS-1 consists of a top-mount main tool (including source, switch, and chamber) and an ergonomically designed operator console. It also has a bottom-mount Magnetron sputtering head and source, as well as matched independent sputter source and target assemblies. The asset also features ground-breaking measurement and control capabilities, such as Automatic Power Feedback, Digimatic Control, high-speed process control, and a data logging model. This ensures precise control of the sputter deposition rates, as well as the ability to record information for process optimization and improved process capability. The sputter head and source are designed to maximize uniformity and repeatability, as required for many applications. It is capable of producing extremely small sputter particles sizes, making it capable of producing uniform nanostructured thin films—a great advantage for advanced electronics, sensors and MEMS products. The equipment provides exceptional flexibility to accommodate a wide variety of sputtering process requirements, with the ability to customize each application. This includes automatic target exchange, dual source sputtering, shut-down and resume-start operations, and nozzle cleaning operations to ensure the highest productivity and reliability of the system. ANELVA I-1060 SVII PLUS-1 has all the features required for the highest throughput, precision and reliability for surface processing.
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