Used CANON / ANELVA I-1060 #9144792 for sale

CANON / ANELVA I-1060
ID: 9144792
Wafer Size: 8"
PVD System, 8".
CANON / ANELVA I-1060 is a high-precision, industrial-grade sputtering equipment capable of producing high-purity, uniform thin films. Developed by CANON, the system is widely used in various industries for many applications, such as solar panels, flat panel displays, touch panels, optical storage media, and many other items requiring highly-specified deposition layers. CANON I-1060 is a vertical magnetron sputter unit, which utilizes high-powered magnets to propel plasma ions onto an appropriately-shaped, electrically-isolated substrate. This method enables the user to have a high degree of control over the rate of deposition, uniformity of the deposited material, and other important parameters. The machine also offers the ability to produce films of almost any thickness, making it perfect for applications requiring very thin layers. ANELVA I-1060 offers a wide range of vacuum levels, achieving pressures from 1 to 10-3 mbar, depending on the selected process. This allows for the adaptation of the tool to a variety of substrates and application demands. I-1060 also offers chamber cleaning capabilities, as well as a variety of wafer removals systems, allowing for unmanned operation. In addition, the asset features an automatic gas flow control model and a fine motion positioning equipment for precision control over the entire deposition process. Other features of CANON / ANELVA I-1060 include the use of RF, DC, and pulse-DC sputtering, making it possible to produce oxide films, conductive layers, and alloy films. The system features an internal feedthrough for ultra-high vacuum applications, as well as a multi-step auto-chamber cleaning unit. In addition, CANON I-1060 supports various coating sources, including planar cathodes, sputter guns, rotatable cathodes, and triple-wave magnetron, which helps to achieve high deposition rates and highly-specified thin-film coatings. Overall, ANELVA I-1060 is an exceptional sputtering machine which provides comprehensive deposition capabilities, while adhering to the highest standards of quality. Its flexibility, reliability, and precision make it well-suited to a variety of industrial applications that demand high performance.
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