Used CANON / ANELVA I-1060SV2+1 #9177921 for sale

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CANON / ANELVA I-1060SV2+1
Sold
ID: 9177921
Wafer Size: 8"
PVD System, 8".
CANON I-1060SV2+1 is a multi-purpose sputtering equipment designed for thin film deposition applications. It is used to deposit a variety of metals, alloys, oxides, nitrides and other materials on substrates to create thin films with desired properties. The system consists of several components including a vacuum chamber, powerful magnetron sputtering source, rotating substrate holder for uniform deposition, gas delivery unit and an extensive process controller to monitor and control the machine. The vacuum chamber is constructed of stainless steel and has a cylindrical design with an integrated showerhead sputter target insert. It features an internal viewport to monitor sputtering chambers and has a variable pressure range of 10-3 to 10-8 torr with a base pressure of 10-9 torr. The magnetron sputtering source is composed of two high-power halogen lamps with a maximum output power of 20kw. It has a high ionization rate and offers a wide range of materials to sputter. The rotating substrate holder can be programmed to rotate at an adjustable speed from 0.2 to 10 RPM to create uniform deposition across the entire substrate. The tool also includes an oscillation function for further homogeneity. The gas delivery asset is used to introduce gas into the chamber for desired processing parameters. The model has a gas flow rate of 0-100sccm, with a total gas pressure capacity of 10-3 to 10-8 torr. ANELVA I-1060SV2+1 equipment has an efficient process controller to monitor parameters and change settings during operation. This includes a programmable chamber pressure indicator, temperature indicator and power supply voltage meter. The system also features over temperature and overpressure alarms with electric interlock protective switches. Overall, CANON / ANELVA I-1060SV2+1 is an advanced sputtering unit designed to provide reliable performance and effective deposition. It utilizes innovative technology to offer users the most up-to-date machine available. The wide range of features and components make it an ideal tool for both research and production applications in the thin film deposition industry.
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