Used CANON / ANELVA ILC-1012 Mark II #9269327 for sale

CANON / ANELVA ILC-1012 Mark II
ID: 9269327
Wafer Size: 4"-5"
Sputtering systems, 4"-5".
CANON / ANELVA ILC-1012 Mark II is an advanced sputtering equipment designed for a variety of thin-film coating applications. The system comprises of a sputtering cathode, a plasma-generating power-supply, a gas supply, and a rotating table. At its core, the unit features an inductively coupled plasma (ICP) coil for generating a high-density plasma which is essential for efficient ion bombardment in the sputtering process. The ICP coil generates plasmas of various noble gases such as argon with power densities ranging up to 5.8 kW/cm2. This allows a wide range of sputtering applications, particularly for high-temperature coatings such as gold and iridium. The machine is designed to take advantage of the physical phenomenon of magnetron sputtering where a magnet placed behind the sputtering cathode keeps the particles released from the target material lower at the substrate, increasing coating efficiency. It features a 13.1 cm diameter rectangular target that holds up to 10 kg. The target is able to rotate 360 degrees for even coverage of the substrate and is coated with a thin film of gold or other material to generate sputtered particles. The tool is also equipped with a gas supply that houses up to 5 gas bottles of various noble gases which are used to generate the high-density plasma. The pressure and flow of these gases can be adjusted precisely from the main control panel to optimize the sputtering process. The asset also features a high-precision rotating table that allows for precise and uniform coating of the substrate. The table can rotate from 0 to 6000 revolutions per minute with a minimum step size of 5 rpm, allowing for the precise tailoring of coating thickness. CANON ILC-1012 Mark II is a powerful and highly efficient sputtering model capable of producing high-quality thin-film coatings for a wide variety of applications, making it an ideal choice for coating and deposition laboratories.
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