Used CANON / ANELVA ILC-1013 #9144935 for sale
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CANON / ANELVA ILC-1013 is a sputtering equipment designed specifically for the deposition of nanometer thin films, which makes it ideal for use in semiconductor fabrication and in the creation of multi-layered thin films. It is a magnetron sputtering system that utilizes the use of a magnetron target to unleash a high-powered magnetic field onto a target surface for efficient and precise sputtering. CANON ILC-1013 is designed for precise control of layer thickness and can deposit layers of material that are only a few nanometers thick. It features an intuitive user interface for easy setup, and several functions for automated deposition. ANELVA ILC-1013 utilizes a one-barrel cathode configuration and can be used to deposit films onto a wide array of film substrates. It features two independent and programmable chamber temperatures, as well as a high-precision substrate holder temperature control feature for optimal substrate stability. The unit utilizes an advanced analytical machine for in situ monitoring of the film deposition process. ILC-1013 includes two sputtering guns, which are designed for ease of target exchange and a high degree of repeatability. The guns can be configured for single or dual-component sputtering, allowing the user to select the best mode depending on the application requirements. The tool also features an independent controller for each sputtering gun, which enables users to program custom recipes for each gun and adjust the sputtering parameters in real-time. CANON / ANELVA ILC-1013 sputtering asset is designed to meet a variety of film deposition requirements. It features a chamber size typically able to accommodate 4" substrates, and an optional rotary substrate holder that allows for up to 6" substrates to be processed. Additionally, the model includes an adjustable gas flow rate equipment and a vacuum level controller for automatic vacuum level control to ensure precise and repeatable film deposition. Overall, CANON ILC-1013 is a well-designed sputtering system that provides the user with precise control over layer thickness and custom recipe programming for advanced deposition results. From its high-powered magnetic field to its intuitive user interface and substrate holder temperature control, ANELVA ILC-1013 can help to streamline the process of thin film deposition and get superior results in a wide range of applications.
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