Used CANON / ANELVA ILC 1015 #9302490 for sale

CANON / ANELVA ILC-1015 is a sputtering equipment equipped with a mass flow controller, vacuum system, and power supply. This unit is designed for sputtering applications such as thin film deposition, micro-device fabrication, and substrate cleaning. The machine consists of two main components: the chamber and the power supply platform. The chamber is composed of a vacuum chamber, a deposition source, and a substrate stage. The vacuum chamber is made of stainless steel and has a bell jar design that allows for easy access to the substrates. The deposition source consists of a single target supply with up to four independent sputtering sources mounted on the chamber door. The substrate stage is adjustable and can accommodate up to 200mmx200mm substrates. The power supply platform of CANON ILC-1015 is designed to provide flexible and accurate power control of the sputtering sources, allowing for precise thin film deposition. The platform consists of three types of power supplies: a direct current (DC) power supply for controlling the DC voltage, a pulse-width modulation (PWM) power supply for controlling the PWM of the sputtering source, and an RF power supply. The sputtering power can be adjusted from 0-5kW, enabling the deposition of thick layers and creating uniform spherical clusters of atoms. The tool can be operated with either a manual or automatic mode. In manual mode, the user can control the chamber parameters such as pressure, temperature, and RF power. In automatic mode, the asset is programmed and operated via a personal computer (PC). The user can also use various sensors to measure the deposition rate and substrate temperature. ANELVA ILC-1015 is an advanced sputtering model designed to enable precise and accurate thin film deposition. It is suitable for micro-device fabrication, sputter etching, and other sputtering applications. With its advanced power supply platform and user-friendly operation, ILC-1015 can help researchers achieve their desired results quickly and efficiently.