Used CANON / ANELVA ILC 1051 MKII #9390490 for sale

CANON / ANELVA ILC 1051 MKII is a sputtering equipment used in physical vapor deposition processes. Sputtering is a process used to create thin films on materials, typically metal films on surfaces. This sputter system is powered by a multi-plasma ion source and is specifically designed to provide superior surface quality and high deposition rate. CANON ILC 1051 MKII features a vacuum chamber composed of stainless steel and has a volume of approximately 260 liters. It is equipped with a four-axis linear motor driver, allowing for precise three-dimensional sputter deposition. The unit is also equipped with a load lock chamber and an exhaust pump, which is used to rapidly evacuate the chamber for efficient process cycles. For sputtering, ANELVA ILC-1051 MKII makes use of up to four cathodes, allowing for the deposition of multiple films simultaneously. Each cathode is composed of the target material to be sputtered, and the machine is equipped with an adjustable power supply capable of delivering up to 4500 watts to each cathode. The tool is also equipped with adjustable variable-frequency radio-frequency (RF) power supplies for high frequency sputtering, which helps to promote high deposition rates and uniform layer thickness. ILC-1051 MKII is capable of running various sputter processes, including high-rate and low-rate sputtering, direct, angled, and dual sputtering, as well as rotating cathode sputtering. The asset also has a movable midplane, allowing for the deposition of films onto substrates of various sizes and shapes. ILC 1051 MKII is equipped with an intelligent controller that monitors and controls the sputter process. This controller includes a touch-screen display, programmable buttons, and status indicators that allow operators to monitor the sputtering process in real-time and adjust parameters accordingly. The controller also includes a barcode reader for seamless integration into automated sputtering systems. In conclusion, CANON / ANELVA ILC-1051 MKII is a reliable sputtering model that provides superior surface quality and high deposition rate. This equipment is equipped with a multi-plasma ion source, a 4500 watt adjustable power supply, and a movable midplane that allows for the deposition of films onto substrates of various sizes and shapes. The system is also equipped with an intelligent controller that allows operators to monitor and control the sputtering process in real-time and adjust parameters accordingly.