Used CANON / ANELVA ILC 1051 #293740222 for sale

CANON / ANELVA ILC 1051 is a sputtering equipment designed to deposit thin films of material onto a variety of substrates. This system is widely used in research and development, industrial and university laboratories, and has been widely used in the semiconductor industry to deposit dielectric and metallic layers onto the surface of silicon and gallium arsenide wafers. CANON ILC 1051 is a sputtering unit which uses a magnetron sputtering gun to deposit thin layers of material onto the surface of a substrate. The sputtering gun employs direct current (DC) and reactive radio frequency (RF) power to vaporize target materials and deposit them onto a substrate. The machine features a quartz vacuum chamber which is equipped with a substrate holder, a set of multipole permanent magnets, and ion gauges for measuring pressure and temperature inside the chamber. The substrate holder is designed to hold substrates up to 9.8 inches in diameter. The dc and RF power sources can be individually adjusted to provide the optimum deposition rate and quality. The magnets produce a uniform magnetic field which helps to reduce background plasma and improve uniformity of the deposited layers. The tool has a number of useful features which make it suitable for use in a wide range of applications. It includes an integrated water-cooled target, allowing for an extended target lifetime, as well as an oxygen etch module for cleaning or etching the substrates prior to deposition. It also includes an integrated shutter asset for improved protection against external particles and contaminants. ANELVA ILC-1051 has a high degree of controllability, allowing for accurate and repeatable depositions. The combination of dc andRF power sources provides a high degree of flexibility in the deposition process, with the ability to control the deposition rate and thickness, uniformity, and composition. The model is also capable of supplying different reactive gases for different types of deposition. CANON ILC-1051 is the ideal deposition equipment for applications requiring the highest levels of control and accuracy. It provides excellent uniformity of deposition and can be used to create high quality layers for a wide range of applications.