Used CANON / ANELVA ILC 1051 #9111758 for sale

CANON / ANELVA ILC 1051 is a type of sputtering system that was developed to provide high quality thin film deposition technology. It is renowned for its excellent performance, precision, and accuracy in terms of film layers produced. It is composed of a sputtering chamber, a base chamber, a target chamber, a rotary motor, and an induction power source. The sputtering chamber allows the user to set the desired pressure and temperature of the process, while the target chamber allows for control of the position of the target material in relation to the substrates. The rotary motor enables the precise positioning of the target material in the chamber to achieve the optimum target configuration for the sputtering process. The base chamber houses the substrates and controls the temperature and pressure of the process. The induction power source is used to control the ion currents that transfer the sputtered material onto the substrates. CANON ILC 1051 is capable of performing a variety of sputtering processes such as magnetron sputtering, ionized metal sputtering, and metal-ion plasma sputtering. It can also perform rapid thermal processing. Additionally, it is designed to accept a variety of targets that include but are not limited to oxides, reactive metals, pure metals, alloys, carbon compounds, and various ceramic materials. ANELVA ILC-1051 is a versatile sputtering system that is suitable for a wide range of research applications, including semiconductor manufacturing, thin film solar cell production, optical coatings, and medical device applications. Additionally, it can be used to deposit high quality conductive, adhesive, and protective films for a variety of products. It can also be used to deposit materials for various chemical, electrochemical, and mechanical processes. ILC-1051 is equipped with an open architecture, allowing users to customize their systems to meet their specific requirements. Its precise deposition control and the advanced power sources enable high accuracy in layer uniformity and excellent film properties. The flexibility and adaptability of the system make it a preferred choice among researchers in a variety of industries.