Used CANON / ANELVA ILC 1051 #9121831 for sale

CANON / ANELVA ILC 1051 is a high precision sputtering equipment designed for semiconductor, photovoltaic, and other industrial applications. It features an advanced ion beam source, programmable process controller, and modular design for easy maintenance. The system is capable of performing standard ion-beam sputtering, ion-plating, and chemical vapor deposition (CVD) processes. CANON ILC 1051 offers a range of substrate materials and ion sources, with excellent accuracy and repeatability. The unit uses a high-power ion beam to bombard a semiconductor device, such as a solar cell or LED, creating a thin, conductive film of desired material. The ion beam is generated by a laser which is then focused and directed onto the substrate. The substrate is constructed from a variety of materials, including silicon, gallium nitride, aluminum, and tungsten carbide. The machine is equipped with a programmable process controller which allows for precise control over the sputtering parameters. This includes voltage, gas flow rate, current, and power. It also provides precise control over the deposition rate and temperature of the substrate. The power and temperature of the ion beam can also be adjusted to optimize the sputtering process. ANELVA ILC-1051 is a reliable and efficient sputtering tool which offers maximum performance with minimal downtime. It is designed to provide superior results for a variety of sputtering workloads. The asset is also well-suited for applications requiring high accuracy and repeatability. It has a modular design which allows for easy maintenance and servicing. CANON / ANELVA ILC-1051 is an ideal sputtering model for a wide range of industrial applications.